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New developments in underlayers play key role in advanced EUV lithography Rolla, Mo.– April 11, 2023 – Brewer Science, Inc., a global leader in developing and manufacturing next-generation materials for the microelectronics and optoelectronics industries, will present New Developments in Underlayers and Their Role in Advancing EUV Lithography at Critical Materials Council (CMC) Conference. Demand…
Click Here to Read MoreBrewer Science presents EUV lithography innovation at Fujifilm Advanced Lithography Workshop in Germany Brewer Science will be presenting at the Fujifilm Advanced Lithography Workshop in Desden, Germany on 15 September 2022. Dr. Douglas Guerrero will deliver a presentation titled, Roles of Underlayers in Resist and Underlayer Roadmap for EUV Lithography, during Session II of the…
Click Here to Read MoreBrewer Science presents EUV lithography innovation at largest tech conference in Asia Roles of underlayers in EUV lithography is the keynote speech at CSTIC 2022 Rolla, Mo. June 20, 2022 - Brewer Science, Inc., a global leader in developing and manufacturing next-generation materials and processes for the microelectronics and optoelectronics industries, will present the…
Click Here to Read MoreTo the average consumer, the path of new technology looks pretty linear. A cool new concept emerges, scientists figure out how to manufacture it, and pretty soon consumers can find it in a product. But people who work in technology know that’s hardly ever the case. On September 9th, Darron Jurajda, the Brewer Science Semiconductor…
Click Here to Read MoreOctober 24-26, 2016 Hiroshima, Japan http://euvl2016.org/ Please look for Tanti Ouattara's poster at 2016 International EUVL Symposium.
Click Here to Read MoreCost of ownership plays an important role in lithography process materials and methods decisions. Process simplifications brought about by layer-to-layer synergy drive significant cost of ownership advantages for multilayer lithography systems such as the Brewer Science® OptiStack® system. Savings in mask engineering and manufacture are the greatest cost difference. Optical proximity correction (OPC) algorithms need…
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