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Dual-layer light-sensitive developer soluble bottom anti-reflective coatings for 193-nm lithography
Click Here to Read MoreHighly crosslinked polymer dielectric films for improved capacitor performance
Click Here to Read MoreCyclic olefin polymer compositions and polysiloxane release layers for use in temporary wafer bonding processes
Click Here to Read MoreNon-covalently cross-linkable materials for photolithography processes
Click Here to Read MoreNonpolymeric antireflection compositions containing adamantyl groups
Click Here to Read MoreReversal lithography approach by selective deposition of nanoparticles
Click Here to Read MoreFluorinated polyimides with fluorene cardo structure as optical materials that have low absolute thermo-optic coefficients
Click Here to Read MoreSilicone polymers with high refractive indices and extended pot life
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