Products
Experience the difference with Brewer Science's revolutionizing technologies. We offer an extensive range of products, from lithography materials to equipment, that impact our everyday lives.
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Brewer Science lithography products have been shaping the semiconductor industry since 1981. Over the years, new product lines, capabilities, and specifications have been improved to deliver the best
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BrewerBOND® T1100/C1300 Series Materials enable our unique VersaLayer solution for high-temperature and high-stress applications found within the semiconductor industry.
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Brewer Science is proud to offer an extensive program dedicated to exploring new realms of sensor performance – environmental monitoring.
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Brewer Science’s integrated sensor system is an automated system that enables more predictive analytics.
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The biggest problem facing lithographers using EUV is the RLS trade-off: simultaneous improvement of resolution, line width roughness, and photosensitivity.
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Brewer Science is changing how environmental and process data is captured, transmitted, and analyzed using custom-designed printed electronics systems.
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BrewerBOND® 530 mechanical debonding release material offers additional choices for stronger adhesions necessary for high stress/high temperature temporary bonding applications.
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OptiStack® multilayer systems are our flagship lithography technology, and are used for leading-edge high volume IC manufacturing.
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ProTEK® B3 coatings thin films are spin-applied polymeric coating systems that provide temporary wet-etch protection for CMOS MEMS circuitry during alkaline or acid etches.
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ARC® antireflective coatings are the industry benchmark for reflection control and light absorption during photolithography.
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Temporary wafer bonding release material for mechanical debonding applications
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This UV laser release material was designed to benefit a variety of temporary bonding, debonding market applications including chip-first/chip-last and RDL-first FOWLP processes.
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BrewerBOND® 305 temporary wafer bonding material is an organic coating that enables back-end-of-line (BEOL) processing of ultrathin wafers using standard semiconductor equipment.